Product classification
Thermal evaporation and magnetron sputtering coating machine
This device has the functions of thermal evaporation and magnetron sputtering coating within the same vacuum chamber, suitable for the deposition of various single-layer films, multi-layer films, and doped film systems; it can coat various hard films, metal films, alloys, compounds, semiconductors, ceramic films, dielectric composite films, and can also coat ferromagnetic materials.
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Product Details
1. Application Field
The device has thermal evaporation and magnetron sputtering coating functions in the same vacuum chamber, used for the deposition of various single-layer films, multi-layer films, and doped film systems; it can coat various hard films, metal films, alloys, compounds, semiconductors, ceramic films, dielectric composite films, and can also coat ferromagnetic materials.
2. Performance Parameters
1. Ultimate vacuum pressure: 8×10-5Pa;
2. Magnetron target: 2 pieces, target diameter: Φ50, equipped with electric (gas) movable baffle;
3. Vacuum recovery pumping time (min): <30;
4. Vacuum chamber: Φ500×550;
5. Evaporation electrodes: 2 pairs, 2KW equipped with electric (gas) movable baffle;
6. Sample stage: planetary rotation, rotation: 2-20rpm adjustable;
7. Bias, film thickness gauge, thin film gauge, sample stage heating optional;
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