Product classification
Multi-arc + Magnetron Sputtering Composite Coating Machine
This device can deposit metals, alloys, and various dielectric films, and can perform reactive sputtering; it is used for the research and development of hard films, decorative films, and other functional films.
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Product Details
1. Application Field:
This device can deposit metals, alloys, and various medium films, and can perform reactive sputtering; it is used for the research and development of hard films, decorative films, and other functional films.
2. Performance Parameters:
1. Φ500x500 vertical water-cooled chamber,
2. Equipped with 3 DN100 multi-arc targets and 1 4" planar circular target;
3. Planar target equipped with 1000W RF power supply; the system can apply bias, with the bias power supply being pulsed DC, power 2000W;
4. Maximum process heating temperature 500℃,
5. Sample holder rotates, with a rotation speed of 0-50rpm adjustable;
6. The system is equipped with 4 channels of MFC process gases.
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