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Multi-arc + Magnetron Sputtering Composite Coating Machine

This device can deposit metals, alloys, and various dielectric films, and can perform reactive sputtering; it is used for the research and development of hard films, decorative films, and other functional films.

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Product Details

  1. Application Field:

This device can deposit metals, alloys, and various medium films, and can perform reactive sputtering; it is used for the research and development of hard films, decorative films, and other functional films.

  2. Performance Parameters:

1. Φ500x500 vertical water-cooled chamber,

2. Equipped with 3 DN100 multi-arc targets and 1 4" planar circular target;

3. Planar target equipped with 1000W RF power supply; the system can apply bias, with the bias power supply being pulsed DC, power 2000W;

4. Maximum process heating temperature 500℃,

5. Sample holder rotates, with a rotation speed of 0-50rpm adjustable;

6. The system is equipped with 4 channels of MFC process gases.

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