Product classification

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  • 2、多靶位立式磁控溅射镀膜机.png

Multi-target vertical magnetron sputtering coating machine

This device can deposit single metals, alloys, and various medium films, as well as multilayer films; it is mainly used for the research and small batch production of various functional films (wear-resistant, anti-corrosion, conductive films, insulating films, etc.) on the surfaces of metal and non-metal parts with hub sizes ranging from Φ150 to Φ500.

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Product Details

1. Application Field:

This equipment can deposit single metals, alloys, and various medium films, multi-layer films; mainly used for the research and small batch production of various functional films (wear-resistant, anti-corrosion, conductive films, insulating films, etc.) on the surface of Φ150-Φ500 hub-type metal and non-metal parts.

2. Performance Parameters

1. Φ1000x700 water-cooled vacuum chamber, side-opening door, sample rack with self-rotation;

2. Eight sputtering target positions arranged on the top and sides;

3. Six 6" DC targets, each equipped with one set of 3KW DC power supply;

4. Two 6" RF targets, each equipped with one set of 1.5KW RF power supply;

5. The system is equipped with a Kaufman ion source for workpiece cleaning;

6. The chamber can be heated, with a maximum heating temperature of 300℃.

7. Ultimate vacuum: 5x10-4Pa.

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