Product
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Product classification
Display Panel Industry - ITO/Metal Electrode R&D Pilot Line
This device is a high vacuum ITO box-type coating equipment, mainly used for depositing transparent conductive films such as AZO and GZO series, metal films, semiconductor films, etc. It can also be used for the deposition of other functional films.
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Product Details
1. Application Field:
This device is a high vacuum ITO box-type coating equipment, mainly used for depositing transparent conductive films such as AZO, GZO, metal films, semiconductor films, etc., and can also be used for the deposition of other functional films.
1. The system can achieve research and process exploration of transparent conductive films such as ITO, AZO, GZO, etc.;
2. It can complete sputter deposition of single metals, alloys, and multilayer films;
3. It can complete reactive sputter deposition of dielectric films such as oxides, nitrides, and carbides;
4. It can achieve sputter deposition of insulating materials such as SiO2, Al2O3;
5. It can conduct research and development of functional films containing the above multilayer films;
2. Performance Parameters:
1. Dual-chamber structure (including process chamber and sample entry/exit chamber);
2. Maximum sputtering sample size approximately 450×250mm;
3. Four magnetic sputtering targets, two of which are twin targets, with two sets of DC power supplies and one set of medium frequency power supply;
4. Equipped with three gas lines and corresponding flow controllers;
5. Equipped with an axial linear reciprocating motion sample stage;
6. Online film thickness detection device;
7. Heating and temperature control system, ensuring the chamber can be heated to 500℃.
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