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Linear Coating Machine for Liao'e Lens
The linear Laue lens coating machine is a high-end instrument developed for the High Energy Photon Source (HEPS), used for preparing hard X-ray nano-focusing Laue lens films. The main features include a high number of film layers (thousands or even more) and high precision in the position and thickness of the layers (the average total position error is less than ±5nm, and the thickness error of each layer is less than 0.1nm). To ensure the thickness precision of each film layer, magnetron sputtering technology is employed for the preparation of the films. The advantages of this technology include precise control of film layer thickness, good repeatability, strong adhesion between the film and substrate, and high purity and density of the films.
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Product Details
The linear Laue lens coating machine is a high-end instrument developed for the high-energy synchrotron radiation source (HEPS), used for preparing hard X-ray nano-focused Laue lens films. The main features are a high number of film layers (thousands or more) and high precision in layer position and thickness (average total position error less than ±5nm, thickness error of each layer less than 0.1nm). To ensure the thickness precision of each film layer, magnetron sputtering technology is used for film preparation, which has the advantages of precise control over layer thickness, good repeatability, strong adhesion between the film and substrate, high film purity, and good density.
Performance parameters:
Sample chamber
Base vacuum limit <8×10-5Pa
Chamber leakage rate <1×10-7Pa.L/s
Maximum substrate heating temperature ≥500℃
Deposition chamber
Ultimate vacuum: <8×10-6Pa
Chamber leakage rate <1×10-8Pa.L/s
Number of target positions ≥9
Distance between target and sample 60~100mm manually adjustable
Number of switchable target positions per power supply ≥4
Maximum substrate heating temperature ≥200℃
Motion system speed stability ≤0.1% /300mm
Motion system straightness ≤30μm/300mm
Detection chamber
Ultimate vacuum: <8×10-6Pa
Chamber leakage rate <1×10-8Pa.L/s
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