Linear Laue lens plating machine is a high-end equipment developed for high-energy synchrotron radiation source (HepS), which is used to prepare hard X-ray nano focusing Laue lens film. The most important feature is that there are many layers (thousands or even more) and the accuracy of film position and thickness is high (the average error of total position is less than ± 5nm, and the thickness error of each layer is less than 0.1nm). In order to ensure the thickness accuracy of each film, the magnetron sputtering technology is used to prepare the film. Its advantages are that the film thickness can be accurately controlled, the repeatability is good, the film is closely combined with the substrate, and the film has high purity and good compactness.