Multi-target vertical magnetron sputtering coating machine
1、 Application fields:
The equipment can deposit single metal, alloy, various dielectric films and multilayer films; it is mainly used for R & D and small batch production of various functional films (wear-resistant, anti-corrosion, conductive film, insulating film, etc.) deposited on the surface of Φ 150 - Φ 500 hub type metal and non-metal parts.
2、 Performance parameters
1. Φ 1000x700 water-cooled vacuum chamber, side door, sample rack male rotation;
2. There are 8 sputtering targets on the top and side;
There are 6 3.6 ″ DC targets, each equipped with a set of 3KW DC power supply;
2 4.6 "RF targets, each equipped with 1.5KW RF power supply;
5. The system is equipped with Kaufman ion source for workpiece cleaning;
6. The chamber can be heated, and the maximum heating temperature is 300 ℃.
7. Limit vacuum: 5x10-4pa.
KYVAC Technology Co., Ltd.
Contact address：No.13, North ertiao, Zhongguancun, Haidian District, Beijing