Product classification
Double-chamber multifunctional magnetron sputtering coating machine
1、 Application fields
The device is used for deposition of various monolayers, multilayers and doped films. It can be plated with hard film, metal film, alloy, compound, semiconductor, ceramic film, dielectric composite film and ferromagnetic material. As shown in the figure, the coater has two chambers, sharing a high vacuum system. In order to avoid cross contamination, one chamber can realize electron gun / resistance evaporation coating, and the other chamber can realize sputtering coating.
2、 Performance parameters
1. Limit vacuum pressure: 5 × 10-5pa;
2. Magnetron target: diameter: Φ 50, quantity: 2-4;
3. Target power per unit area: (w / cm2) 5-20;
4. Target power (W): dc500w, rf500w;
5. Substrate heating temperature: 0 ～ 500 ℃ controllable;
6. Process gas: MFC 1-3 channels;
7. Sample rack: Revolution 2-20rpm adjustable;
8. Electron gun: 1 set of 6-10kw electric (pneumatic) baffle;
9. Evaporation power supply: quantity: 1-2 groups, power: 2kW, voltage: 0-35v;
10. Other configuration: bias, film thickness gauge, film gauge, magnetic control target, electric (pneumatic) baffle optional;
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Contact us
KYVAC Technology Co., Ltd.
Contact number：010-61778196
Project communication：18611455296
Customer service：18611455375
Complaints Hotline：18611455295
Shop phone：010-82548098
Suzhou Kemei：18611455368
Contact email：kyvac@kyky.com.cn
Contact address：No.13, North ertiao, Zhongguancun, Haidian District, Beijing
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