sousuo
product

Product classification

All categories
Where are you now:
Homepage
/
/
/
/
Thermal evaporation and magnetron sputtering coating machine
Number of views:
1000

Thermal evaporation and magnetron sputtering coating machine

The equipment has the functions of thermal evaporation and magnetron sputtering in the same vacuum chamber, and can be used for deposition of various single-layer films, multi-layer films and doped films; it can be used for plating various hard films, metal films, alloys, compounds, semiconductors, ceramic films, dielectric composite films, and ferromagnetic materials.
Retail price
0.0
Market price
0.0
Number of views:
1000
Product serial number
Quantity
-
+
Stock:
0
Product details
Parameters

1、 Application fields

The equipment has the functions of thermal evaporation and magnetron sputtering in the same vacuum chamber, and can be used for deposition of various single-layer films, multi-layer films and doped films; it can be used for plating various hard films, metal films, alloys, compounds, semiconductors, ceramic films, dielectric composite films, and ferromagnetic materials.

2、 Performance parameters

1. Limit vacuum pressure: 8 × 10-5 PA;

2. Magnetic control target: 2 targets, diameter: Φ 50, power distribution (pneumatic) baffle;

3. Recovery time of vacuum pumping (min): < 30;

4. Vacuum chamber: Φ 500 × 550;

5. Evaporation electrode: 2 pairs of 2kW distribution (pneumatic) baffle;

6. Sample table: public rotation, public rotation: 2-20rpm adjustable;

7. Bias voltage, film thickness gauge, film gauge and sample heating are optional;

Scan the QR code to read on your phone
We could not find any corresponding parameters, please add them to the properties table
TOP

Beijing Zhongke Kemei Technology Co., Ltd