Multi-arc + magnetron sputtering composite coating machine
1、 Application fields:
The device can deposit metal, alloy and various dielectric films, and can be used for reactive sputtering. It is also used for the research and development of hard films, decorative films and other functional films.
2、 Performance parameters:
1. Φ 500x500 vertical water cooling chamber,
2. Three DN 100 multi arc targets and one 4 ″ plane round target are provided;
3. The plane target is equipped with 1000W RF power supply; the system can be biased, the bias power supply is pulsed DC, the power is 2000W;
4. The maximum process heating temperature is 500 ℃,
5. The sample holder rotates freely, and the revolution speed is adjustable from 0 to 50rpm;
6. The system is equipped with 4 channels of MFC process gas.
KYVAC Technology Co., Ltd.
Contact address：No.13, North ertiao, Zhongguancun, Haidian District, Beijing