The equipment is a Φ 1200x6000 water-cooled vacuum chamber, equipped with mobile male self rotating tooling, with a loading capacity of 10-20 pieces, and the male self rotating tooling can operate automatically point to point; the equipment has the functions of bias cleaning and auxiliary deposition, and the process heating temperature is 300 ℃; the equipment is equipped with 5 cylindrical targets or internal flat targets; it can be plated with Au, Ag, Al, Mo, Cu, Ti and other bottom metals, and is composed of Al, Ti, Si, etc The system can meet the requirements of the development and small batch production of optical interference film, cermet film and other selective endothermic films.