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ITO/metal electrode R&D pilot line
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ITO/metal electrode R&D pilot line

The equipment is a high vacuum ITO box type coating equipment, which is mainly used for deposition of azo, GZO series transparent conductive films, metal films, semiconductor films, etc., and can also be used for deposition of other functional films.
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1、 Application fields:

The equipment is a high vacuum ITO box type coating equipment, which is mainly used for deposition of azo, GZO series transparent conductive films, metal films, semiconductor films, etc., and can also be used for deposition of other functional films.

1. The system can realize the research and process exploration of ITO, azo, GZO series transparent conductive films;

2. Single metal, alloy and multilayer films can be sputtered and deposited;

3. Reactive sputtering deposition of oxide, nitride, carbide and other dielectric films can be completed;

4. Sputtering deposition of SiO2, Al2O3 and other insulating materials can be realized;

5. Research and development of functional films containing the above multilayer films can be carried out;

2、 Performance parameters:

1. Double chamber structure (including process chamber and sample inlet and outlet chamber);

2. The maximum sputtering sample size is about 450 × 250mm;

3. There are four magnetron sputtering targets, two of which are twin targets, and the control power supply is two sets of DC power supply and one set of intermediate frequency power supply;

4. Equipped with three-way gas and corresponding flow controller;

5. Equipped with axial linear reciprocating motion sample table;

6. Online film thickness detection device;

7. Heating and temperature control system to ensure that the chamber can be heated to 500 ℃;

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Beijing Zhongke Kemei Technology Co., Ltd