sousuo
product

Product classification

All categories
Where are you now:
Homepage
/
/
/
/
Linear Lloyd lens coating machine
Number of views:
1000

Linear Lloyd lens coating machine

Linear Laue lens plating machine is a high-end equipment developed for high-energy synchrotron radiation source (HepS), which is used to prepare hard X-ray nano focusing Laue lens film. The most important feature is that there are many layers (thousands or even more) and the accuracy of film position and thickness is high (the average error of total position is less than ± 5nm, and the thickness error of each layer is less than 0.1nm). In order to ensure the thickness accuracy of each film, the magnetron sputtering technology is used to prepare the film. Its advantages are that the film thickness can be accurately controlled, the repeatability is good, the film is closely combined with the substrate, and the film has high purity and good compactness.
Retail price
0.0
Market price
0.0
Number of views:
1000
Product serial number
Quantity
-
+
Stock:
0
Product details
Parameters

Linear Laue lens plating machine is a high-end equipment developed for high-energy synchrotron radiation source (HepS), which is used to prepare hard X-ray nano focusing Laue lens film. The most important feature is that there are many layers (thousands or even more) and the accuracy of film position and thickness is high (the average error of total position is less than ± 5nm, and the thickness error of each layer is less than 0.1nm). In order to ensure the thickness accuracy of each film, the magnetron sputtering technology is used to prepare the film. Its advantages are that the film thickness can be accurately controlled, the repeatability is good, the film is closely combined with the substrate, and the film has high purity and good compactness.

Performance parameters:

Injection chamber

Background vacuum limit < 8 × 10-5pa

The chamber leakage rate was less than 1 × 10-7 pa.l/s

The maximum heating temperature of the substrate is ≥ 500 ℃

Sedimentation chamber

Limit vacuum degree: < 8 × 10-6pa

The chamber leakage rate was less than 1 × 10-8 pa.l/s

Number of target sites ≥ 9

The distance between the target and the sample is 60 ~ 100 mm, which can be adjusted manually

The number of switchable targets for a single power supply is more than or equal to 4

Maximum heating temperature of substrate ≥ 200 ℃

Speed stability of motion system ≤ 0.1% / 300 mm

Straightness of motion system ≤ 30 μ M / 300 mm

Testing room

Limit vacuum degree: < 8 × 10-6pa

The chamber leakage rate was less than 1 × 10-8 pa.l/s

Scan the QR code to read on your phone
We could not find any corresponding parameters, please add them to the properties table
TOP

Beijing Zhongke Kemei Technology Co., Ltd